著者

塩野 忠久 長田 祐介 中川 恭彦

出版者

超音波エレクトロニクスの基礎と応用に関するシンポジウム運営委員会

雑誌

超音波エレクトロニクスの基礎と応用に関するシンポジウム講演論文集 (ISSN:13488236)

巻号頁・発行日

vol.27, pp.15-16, 2006-11-15

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In frequency adjustment of the crystal resonator by ion beam etching, the phenomenon which frequency shifts immediately after etching arose, and it became the big cause which barred utilization. So, theoretical analysis of this frequency change was conducted. Temperature distribution change of the crystal resonator at the time of ion beam irradiation was calculated by the FDM. Thermal stress distribution was calculated from temperature distribution, and change of resonance frequency was calculated from change of the elastic constant. Analysis carrying out about AT, BT, and SC cut, calculation and an experimental result were well in agreement. Therefore, it turned out that thermal stress arises in temperature distribution change produced by ion beam irradiation, an elastic constant changes, and frequency changes.