著者

Kondo Takahiro Kato Hiroyuki S. Bonn Mischa Kawai Maki

出版者

American Institute of Physics

雑誌

The journal of chemical physics (ISSN:00219606)

巻号頁・発行日

vol.126, no.18, pp.181103, 2007-05

被引用文献数

28 17

---

The isothermal crystallization process of thin amorphous solid water (ASW) films on Ru(0001) has been investigated in real time by simultaneously employing helium atom scattering, infrared reflection absorption spectroscopy, and isothermal temperature-programmed desorption. The measurements reveal that the crystallization mechanism consists of random nucleation events in the bulk of the ASW films, followed by homogeneous growth. Morphological changes of the solid water film during crystallization expose the water monolayer just above the substrate to the vacuum during the crystallization process.

著者

Kondo Takahiro Kato Hiroyuki S. Bonn Mischa Kawai Maki

出版者

American Institute of Physics

雑誌

The journal of chemical physics (ISSN:00219606)

巻号頁・発行日

vol.127, no.9, pp.094703, 2007-09

被引用文献数

41 20

---

The deposition and the isothermal crystallization kinetics of thin amorphous solid water (ASW) films on both Ru(0001) and CO-precovered Ru(0001) have been investigated in real time by simultaneously employing helium atom scattering, infrared reflection absorption spectroscopy, and isothermal temperature-programmed desorption. During ASW deposition, the interaction between water and the substrate depends critically on the amount of preadsorbed CO. However, the mechanism and kinetics of the crystallization of ~50 layers thick ASW film were found to be independent of the amount of preadsorbed CO. We demonstrate that crystallization occurs through random nucleation events in the bulk of the material, followed by homogeneous growth, for solid water on both substrates. The morphological change involving the formation of three-dimensional grains of crystalline ice results in the exposure of the water monolayer just above the substrate to the vacuum during the crystallization process on both substrates.