- 著者
- Uchida Noriyuki Mikami Youhei Kintoh Hiroshi Murakami Kouichi Fukata Naoki Mitome Masanori Hase Muneaki Kitajima Masahiro
- 出版者
- American Institute of Physics
- 雑誌
- Applied physics letters (ISSN:00036951)
- 巻号頁・発行日
- vol.92, no.15, pp.153112, 2008-04
- 被引用文献数
- 5
We have developed a robust method for fabricating Si nanoregions in silica glass using femtosecond laser processing. We attained a vivid formation of silicon-rich nanoregions site-selectively generated in SiO2 by irradiation of femtosecond laser pulses to the interface of a SiO2 substrate and deposited aluminum (Al) thin film, where the Al element acts as a gettering site for O atoms. Growth of high-density Si nanocrystals and amorphous Si was observed by transmission electron microscopy in the region that was multiply irradiated with the femtosecond laser. Furthermore, local annealing with a cw laser enhances the Si nanocrystal growth, which was determined by micro-Raman measurements.