著者
Morgan Daniel Sultana Mahbuba Fatima Husna Sugiyama Sho Fareed Qhalid Adivarahan Vinod Lachab Mohamed Khan Asif
出版者
The Japan Society of Applied Physics
雑誌
Applied physics express (ISSN:18820778)
巻号頁・発行日
vol.4, no.11, pp.114101-114101-3, 2011-11-25
被引用文献数
1 23

This letter presents the dc characteristics of normally Off AlInN/AlN/GaN metal--oxide--semiconductor heterostructure field-effect transistors (MOS-HFETs). The devices were fabricated using a recessed gate and SiON dielectric layers for gate isolation. For a device with a 1.5 μm gate length and an 8-μm-long channel, the threshold voltage was above +1.5 V and a maximum drain current density of 0.7 A/mm was reached under 6 V gate bias. These enhancement-mode MOS-HFETs have an excellent potential for power electronics applications.

言及状況

外部データベース (DOI)

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こんな論文どうですか? Enhancement-Mode Insulating-Gate AlInN/AlN/GaN Heterostructure Field-Effect Tran(Morgan Danielほか),2011 … https://t.co/nFziGg4CIN

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