Amorphous carbon and silica-based films synthesized by atmospheric pressure plasma CVD method - 文献詳細 - Ceek.jp Altmetrics

1 0 0 0 Amorphous carbon and silica-based films synthesized by atmospheric pressure plasma CVD method

著者: 登坂万結
出版者: 慶應義塾大学
巻号頁・発行日: 2013

博士論文

2020-09-02 04:28:29
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https://ci.nii.ac.jp/naid/500000574945

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https://ci.nii.ac.jp/naid/500000574945?l=ja (1)