- 著者
-
小駒 益弘
- 出版者
- 一般社団法人 日本真空学会
- 雑誌
- Journal of the Vacuum Society of Japan (ISSN:18822398)
- 巻号頁・発行日
- vol.51, no.1, pp.2-7, 2008 (Released:2008-03-18)
- 参考文献数
- 12
- 被引用文献数
-
3
Kogoma and coworkers previously reported that a homogenous glow plasma can be sustained using a barrier-type electrode system in an atmospheric pressure He gas. This approach succeeded in the surface treatment of industrial plastic films and deposition of solid substances that have usually treated in the low pressure glow plasma system. So, the use of atmospheric pressure glow plasma (APG) system should reduce the costs of plasma treatment for many kinds of the solid materials. In the review, at first, the basic theory of the atmospheric-pressure glow plasma will be introduced to explain how to attain the homogenous glow plasma in high pressure condition. Then, the prospects will be presented for different styles of low temperature atmospheric pressure plasma systems. In the final part, some application studies such as organic film deposition, silica film deposition and surface treatment of liquid crystal polymer using APG plasma will be shown.