著者

山下 宗宏 尾上 雄平 佐野 和男 原 一仁 馬込 正勝

出版者

公益社団法人 日本口腔インプラント学会

雑誌

日本口腔インプラント学会誌 (ISSN:09146695)

巻号頁・発行日

vol.17, no.3, pp.331-336, 2004-09-30 (Released:2015-02-10)

参考文献数

20

---

Globular titanium with a diameter of 212~250 μm was prepared using the rotating electrode method. It was then sintered under vacuum conditions to produce solid titanium material, to make the implant. We investigated the titanium implant material by evaluating the bond strength of the titanium particles to the titanium implant, the void area between titanium particles, the polarization resistance of titanium particles to the globular titanium implant, and alternating-current (AC) impedance properties. The following findings were obtained. 1. A shear force of about 5N was shown between the globular titanium implant and the titanium particles, although measurement was difficult. 2. The void area between globular titanium particles with a diameter of 212~250 μm ranged from 1.84×10-3 mm2 to 2.56×10-3mm2. 3. The Ecorr range of the titanium and globular titanium implant in 0.9% NaCl and artificial saliva aolution was -201~ -347 mV, and Icorr was 0.04×10-5~1.3×10-5mA/cm2. For titanium particles, Ecorr was -346 mV, and Icorr was 1.04×10-5mA/cm2. 4. The alternating current impedance measurement demonstrated increased corrosion resistance of the titanium material and globular titanium implant, which formed a passive oxide film in 0.9% NaCl and artificial saliva.