Photoconductivity in silicon hyperdoped with sulfur and selenium above the insulator-to-metal transition was measured via photoinduced changes in the microwave reflectivity of hyperdoped layers formed on p-type silicon. Despite these materials' strong subgap optical absorption, exposing them to 1310 and 1550 nm light results in a change in conductivity per photon 10,000 times smaller than what is observed in untreated silicon exposed to 980 nm light. A similar bound applies for 405 nm light, which is absorbed entirely in the hyperdoped layer. We use these results to deduce that the photocarrier lifetime in the hyperdoped material is {\leq}100 ns.