- 著者
- Makimura Tetsuya Uchida Satoshi Murakami Kouichi Niino Hiroyuki
- 出版者
- American Institute of Physics
- 雑誌
- Applied physics letters (ISSN:00036951)
- 巻号頁・発行日
- vol.89, no.10, pp.101118, 2006-09
- 被引用文献数
- 21
In order to demonstrate silica nanomachining, the authors fabricated line-and-space contact masks with spaces of 53 and 70 nm on silica glass plates, followed by irradiation with laser plasma softx rays (LPSXs) with wavelengths around 10 nm. Trenches with the narrowest width of 54 nm and an aspect ratio of ~1 were fabricated by the LPSX irradiation through the contact masks. It was also clarified that silica glass can be machined by irradiation with LPSXs in the wavelength range of 6–30 nm in Ar gas which was used as an x-ray bandpass filter.
- 著者
- Makimura Tetsuya Miyamoto Hisao Kenmotsu Youichi Murakami Kouichi Niino Hiroyuki
- 出版者
- American Institute of Physics
- 雑誌
- Applied physics letters (ISSN:00036951)
- 巻号頁・発行日
- vol.86, no.10, pp.103111, 2005-03
- 被引用文献数
- 38 40
We have investigated direct micromachining of quartz glass, using pulsed laser plasma soft x-rays (LPSXs) having a potential capability of nanomachining because the diffraction limit is ~10 nm. The LPSX's were generated by irradiation of a Ta target with 532 nm laser light from a conventional Q switched Nd:YAG laser at 700 mJ/pulse. In order to achieve a sufficient power density of LPSX's beyond the ablation threshold, we developed an ellipsoidal mirror to obtain efficient focusing of LPSXs at around 10 nm. It was found that quartz glass plates are smoothly ablated at 45 nm/shot using the focused and pulsed LPSX's.