著者

Makimura Tetsuya Uchida Satoshi Murakami Kouichi Niino Hiroyuki

出版者

American Institute of Physics

雑誌

Applied physics letters (ISSN:00036951)

巻号頁・発行日

vol.89, no.10, pp.101118, 2006-09

被引用文献数

21

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In order to demonstrate silica nanomachining, the authors fabricated line-and-space contact masks with spaces of 53 and 70 nm on silica glass plates, followed by irradiation with laser plasma softx rays (LPSXs) with wavelengths around 10 nm. Trenches with the narrowest width of 54 nm and an aspect ratio of ~1 were fabricated by the LPSX irradiation through the contact masks. It was also clarified that silica glass can be machined by irradiation with LPSXs in the wavelength range of 6–30 nm in Ar gas which was used as an x-ray bandpass filter.