- 著者
- Zenji YATABE Koshi NISHIYAMA Takaaki TSUDA Yusui NAKAMURA
- 出版者
- The Ceramic Society of Japan
- 雑誌
- Journal of the Ceramic Society of Japan (ISSN:18820743)
- 巻号頁・発行日
- vol.127, no.8, pp.590-593, 2019-08-01 (Released:2019-08-01)
- 参考文献数
- 22
- 被引用文献数
- 1 2
Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method.