著者

Zenji YATABE Koshi NISHIYAMA Takaaki TSUDA Yusui NAKAMURA

出版者

The Ceramic Society of Japan

雑誌

Journal of the Ceramic Society of Japan (ISSN:18820743)

巻号頁・発行日

vol.127, no.8, pp.590-593, 2019-08-01 (Released:2019-08-01)

参考文献数

22

被引用文献数

1 2

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Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method.