著者

SEWELL Harry

出版者

社団法人応用物理学会

雑誌

Japanese journal of applied physics. Pt. 1, Regular papers & short notes (ISSN:00214922)

巻号頁・発行日

vol.34, no.12, pp.6622-6630, 1995-12-01

参考文献数

3

被引用文献数

4

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This paper reviews all the major aspects of successfully implementing a “mix and match” (Deep-UV/I-line, stepper/scanner) strategy. The resolution and linewidth-control limits of I-line are quantified for a number of the process levels and compared with the capabilities of Deep-UV step-and-scan. This analysis predicts the typical mix of steppers and scanners in a 256 MBit production line for 250 nm lithography. A step-by-step procedure to achieve and monitor successful matching is reviewed. The procedure begins by defining a “golden system”, which is used to produce reference wafers for the setup and monitoring of all the systems being mixed and matched. The reference wafers are used to ensure that the pre-aligners of the systems are calibrated and that offsets are adapted to allow the transfer of wafers between systems. The wafers are also used to match both wafer-stage grid and exposure-field distortions. The matching of both wafer-grid and stepper-field distortions are reviewed. The implementation of stage correction-tables is demonstrated. It is indicated that grid matching to better than 10 nm is achievable. It is also indicated that the dynamic scanning of a step-and-scan system allows the monitoring and correction of such typical stepper problems as field magnification and rotation. The critical aspects of multi-field matching between stepper and scanner are analyzed. The key factors that allow the successful overlaying of large, single, scanned fields with multiple, small, stepped fields are reviewed. The total overlay accuracy achieved using step-and-scan, and “mix-and-match” is analyzed and demonstrated.