著者

鄭 相鐵 今石 宣之

出版者

九州大学

雑誌

九州大学機能物質科学研究所報告 (ISSN:09143793)

巻号頁・発行日

vol.11, no.1, pp.7-12, 1997-07-25

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Low pressure metal organic chemical vapor deposition (LPMOCVD) of Li_2O solid thin films from Li(DPM) in nitrogen-oxygen or argon-oxygen atmosphere is experimentally investigated by using a small hot wall tubular type reactor. XRD and ESCA analyses revealed that Li_2CO_3 film grows in nitrogen-oxygen atmosphere and Li_2O grows in argon-oxygen atmosphere. The grown lithium oxide or carbonate reacts with silicon or silica base materials to produce silicates. The CVD model analysis by means of the well known micro trench method and Monte Carlo simulation was not fully successful, but set of data on gas phase reaction rate constant and surface reaction constant was obtained.