著者

Lee DongKwan Pawlowski Georg

出版者

フォトポリマー学会

雑誌

Journal of Photopolymer Science and Technology (ISSN:09149244)

巻号頁・発行日

vol.15, no.3, pp.427-434, 2002

被引用文献数

7

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A review of the progress in DUV single layer resist technology during the last 10 years is presented and some of the more recent performance achievements are highlighted.<br><b>Once upon a time there was a princess who's afternoon walk was always crossed by an ugly frog, who asked her to give him a kiss. While she long time refused, she finally followed his request with anger and the frog turned into a beatiful prince who married her and they lived a tong and happy life together.<br>Freely adapted after Brothers Grimm 1810</b><br>Particular attention is directed to issues expected to become dominant on the verge from current design rules to the 70nm node, and considered to be of general relevance for photoresist technology, such as pattern collapse, line edge roughness, and defect control. Other areas of discussion include plausible sub 100nm extensions of specific techniques, such as thermal flow, or application of the RELACS process.