著者

三上 博史 周 伝久 高橋 千一郎 佐藤 忠夫 嶋影 和宜

出版者

一般社団法人 資源・素材学会

雑誌

資源と素材 (ISSN:09161740)

巻号頁・発行日

vol.110, no.4, pp.313-318, 1994

被引用文献数

2

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Vanadium diboride (VB<SUB>2</SUB>) film has been synthesized on mild steel and transparent quartz substrates by CVD method, which was carried out at the temperature range of 1073 to 1223K with the hydrogen reduction of VOCl<SUB>3</SUB>-BCl<SUB>3</SUB> mixture under the chemical erquivalent ratio regions of 10 to 40 for H<SUB>2</SUB>-VOCl<SUB>3</SUB> gases and of 40 to 120 for H<SUB>2</SUB>-BCl<SUB>3</SUB> gases. VB<SUB>2</SUB> film involving both Fe<SUB>2</SUB>B and FeB was synthesized on a mild steel substrate because a mild steel plate was borided with BCl<SUB>3</SUB> gas. On the other hand, pure VB<SUB>2</SUB> layer film was prepared on a transparent quartz substrate atthe temperature above 1173K. Futhermore, VB<SUB>2</SUB> film having high orientation and crystallization could not be prepared on a mild steel substrate. However, smooth surface VB<SUB>2</SUB> film having high crystallization and micro-vickers hardness of about 2800Hmv could be synthesized on a transparent quartz substrate at the temperature of 1173K under the conditions of chemical equivalent ratio of 40 for H<SUB>2</SUB>-VOCl<SUB>3</SUB> gases and of 80 for H<SUB>2</SUB>-BCl<SUB>3</SUB> gases.