著者

清水 徹英 ミシェル ビラマヨア ジュリアン ケラウディ ダニエル ルンディン ウルフ ヘルマーソン

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.60, no.9, pp.346-351, 2017 (Released:2017-09-13)

参考文献数

29

被引用文献数

2

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This is to review a novel approach stabilizing reactive mode at transition regime in reactive high-power impulse magnetron sputtering (R-HiPIMS). The proposed method is based on a real-time monitoring of peak discharge current. To stabilize the process conditions at a given set point, a feedback control system, which automatically regulates the pulse frequency, and thereby the average sputtering power, was implemented to maintain a constant maximum discharge current. As a representative result, the variation of the pulse current waveforms over a wide range of reactive gas flows and pulse frequencies during a R-HiPIMS of Hf in an Ar-N2 atmosphere illustrates that the discharge current waveform is an excellent indicator of the process conditions. Applicability of the proposed method was successfully demonstrated.