著者

宮村 会実佳 金田 健志 佐藤 泰史 重里 有三

出版者

一般社団法人 日本真空学会

雑誌

真空 (ISSN:05598516)

巻号頁・発行日

vol.50, no.6, pp.432-436, 2007 (Released:2008-01-01)

参考文献数

13

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Photocatalytic activities of titanium dioxide (TiO2) films deposited by rf sputtering were investigated from view points of their internal stress. TiO2 films were deposited on fused quartz glass or 100 μm thick micro-sheet glass substrates at room temperature, 200 or 400°C under various total gas pressures (Ptot) of 0.3~5.0 Pa with oxygen flow ratio [O2/(O2+Ar)] of 60% using a Ti metal target. Photocatalytic activity was evaluated by photodecomposition of acetaldehyde (CH3CHO) under UV illumination (black light lamp, 0.4 mW/cm2). Compressive internal stress was estimated by cantilever method using the micro-sheet glass, which clearly decreased from -2.1 to -0.1 GPa with the increase in the Ptot from 0.3 to 3.0 Pa. The films with the compressive stress less than -0.5 GPa performed the photocatalytic activity. Furthermore, compressive or tensile stress was applied by external force on the TiO2 films deposited on the curved micro sheet glasses by flattening these substrates after the deposition. The photodecomposition activity of the films with the slight compressive stress improved clearly, whereas the one of the films with the tensile stress degraded.