著者
蛯名 雄太郎 前崎 智博 周 立波 清水 淳 小貫 哲平 尾嶌 裕隆 乾 正知
出版者
公益社団法人 精密工学会
雑誌
精密工学会誌 (ISSN:09120289)
巻号頁・発行日
vol.84, no.7, pp.640-645, 2018-07-05 (Released:2018-07-05)
参考文献数
16

The grinding wheel is comprised by three elements; abrasive grain, bonding material and pore, which are specified by five factors; type of abrasive grain, grain size, type of bonding material, grade of hardness and abrasive grain volume percentage. Regarding the abrasive grain, it is well known that shape and number of cutting edge significantly effects grinding performance such as surface roughness, grinding force and grinding wheel life. In general, abrasive grain size is determined by mean diameter of abrasive grain. However, the abrasive grains in a grinding wheel are randomly scraggly in size and shape. There is no particular aspect to regulate the grain size variation in JIS (Japanese Industrial Standards). This paper investigates the effect of grain size variation on the ground surface topography by actual grinding on silicon wafers and analysis based on grinding simulation. The results reveal that the standard deviation of grain size is a very important index to characterize the grinding performance of a wheel. Smaller standard deviation leads to larger density of effective cutting-edge under the same volume percentage of abrasive grain contained in the wheel. This fact significantly contributes to not only achieve a better surface roughness and more uniform surface integrity, but also shorten the finishing time.
著者
小貫 哲平 桑野 博喜
出版者
一般社団法人日本機械学会
雑誌
日本機械学會論文集. C編 (ISSN:03875024)
巻号頁・発行日
vol.76, no.768, pp.1917-1919, 2010-08-25

Optical (far infrared) and thermal properties of a copper nanostrip array on silicon substrate were investigated. It acted as a coupler between the radiation and heat on the surface as non-radiative components (phonon or plasmon polariton at the surface), aiming to enhance outward heat flux from the surface as a cooling device via radiation heat transfer. The emission spectrum of the heat radiation was controlled by the nanostrip array that was designed as the local plasmon and phonon resonant conditions. In the experiment, it generated the temperature gradient of 1.3K across the substrate thickness (0.5mm) when the substrate was contacted on the heater (42℃) in the atmosphere at 26℃.