2 0 0 0 OA 整備新幹線用高速シンプル架線の開発
- 著者
- 網干 光雄 大浦 泰 小林 輝雄 円谷 哲男 上野 勝禧 金子 誠
- 出版者
- The Institute of Electrical Engineers of Japan
- 雑誌
- 電気学会論文誌D(産業応用部門誌) (ISSN:09136339)
- 巻号頁・発行日
- vol.116, no.4, pp.490-496, 1996-03-20 (Released:2008-12-19)
- 参考文献数
- 15
- 被引用文献数
- 1 1
For Projected Shinkansen, it is necessary to develop an economical overhead catenary system allowing stable train operation at high-speed and meeting the transport demands. In order to develop a new overhead catenary system for this purpose, we designed a high tension simple catenary system with CS contact wire (Copper contact wire with Steel-core), and constructed this system on Tohoku Shinkansen line for operation test. During 4 years, we measured contact loss of pantograph, uplift and stress of contact wire, its maintainability including the wear of contact wire, and others. The test results so far obtained prove that its performance is as high as that of high-tension heavy compound catenary system.
2 0 0 0 OA パンタグラフの動特性に起因した剛体電車線の波状摩耗発生機構
- 著者
- 小山 達弥 網干 光雄
- 出版者
- 一般社団法人 日本機械学会
- 雑誌
- 日本機械学会論文集C編 (ISSN:18848354)
- 巻号頁・発行日
- vol.78, no.789, pp.1617-1631, 2012 (Released:2012-05-25)
- 参考文献数
- 8
When there is an undulating wear on overhead rigid conductor line, arc due to contact loss is generated between the conductor line and a pantograph. The arcs cause extreme wear of contact lines and contact strips of the pantograph. However the mechanism of the undulating wear formation has not been clarified. This paper to make clear the mechanism of the formation of the undulating wear through on-site investigation of overhead rigid conductor lines and excitation tests of the pantograph. It was been clarified that the dynamic characteristics of pantograph and the distance between pantograph heads play a causal role in the undulating wear formation. Firstly, a periodic unevenness is generated by mechanical wear that is caused due to the dynamic characteristics of pantograph, especially anti-resonance phenomenon of pantograph. When the wear amplitude of unevenness grows to the extent with which pantographs cannot comply, arc due to contact loss occurs between overhead rigid conduct line and the pantograph. By this arc, electric wear is generated in a hollow of unevenness, then the undulating wear of which wavelength is related to the interval of pantograph head grows.