- 著者
- Natori Kenji Kimura Yoji Shimizu Tomo
- 出版者
- American Institute of Physics
- 雑誌
- Journal of applied physics (ISSN:00218979)
- 巻号頁・発行日
- vol.97, no.3, pp.034306, 2005-02
- 被引用文献数
- 92
A general expression of the current-voltage characteristics of a ballistic nanowire field-effect transistor (FET) is derived. At T=0, the conductance, which is equal to the quantum conductance multiplied by the number of channels at zero bias, decreases stepwise toward current saturation as the drain bias is increased. The current-voltage characteristics of a single-wall carbon nanotube FET in ballistic conduction are discussed based on the band structure of the nanotube. When both the gate overdrive and the drain bias are equal to 1 V, the device made of a (19,0) nanotube and a 2-nm high-k gate insulator (epsilon=40epsilon(0)) flows a current of 183 muA, which amounts to a current density 48 times as large as the counterpart of a silicon device. The high performance originates from a high carrier density due to the enhanced gate capacitance, and a large carrier velocity caused by the large group velocity of the original graphene band. Quantum capacitance also plays an important role in the device's characteristics.
- 著者
- Natori Kenji
- 出版者
- American Institute of Physics
- 雑誌
- Journal of applied physics (ISSN:00218979)
- 巻号頁・発行日
- vol.76, no.8, pp.4879-4890, 1994-10
- 被引用文献数
- 28 516
Experiments on ultra-small metal-oxide-semiconductor field effect transistors (MOSFETs) less than 100 nm have been widely reported recently. The frequency of carrier scattering events in these ultra-small devices is diminished, so that further suppression of carrier scattering may bring these devices close to the regime of ballistic transport. Carrier scattering is suppressed by constructing their channel regions with intrinsic Si and also by low temperature operation. This article proposes the ballistic transport of carriers in MOSFETs, and presents the current-voltage characteristics of the ballistic n-channel MOSFET. The current is expressed with the elementary parameters without depending on the carrier mobility. It is independent of the channel length and is proportional to the channel width. The current value saturates as the drain voltage is increased and the triode and the pentode operation are specified as in the conventional MOSFET. Similar current-voltage characteristics in the ballistic transport regime are also investigated for the p-channel MOSFET, the dual gate ultra-thin silicon on insulator MOSFET, and the high electron mobility transistor device. The obtained current gives the maximum current limitation of each field effect transistor geometry. The current control mechanism of ballistic MOSFETs is discussed. The current value is governed by the product of the carrier density near the source edge in the channel, and the velocity with which carriers are injected from the source into the channel.Influence of optical phonon emission to the transport is discussed. It is suggested that if the device is operated with relatively low carrier density at low temperatures, and if the scattering processes other than the optical phonon emission are suppressed so as to attain the ballistic transport, the optical phonon emission is also suppressed and ballistic transport is sustained. A convenient figure of merit to show the ballisticity of carrier transport in an experimental MOSFET is proposed. Its value is estimated for some examples of the recent ultra-small MOSFET experiment. The proposed current voltage characteristics are evaluated for a dual gate silicon on insulator MOSFET geometry. The result is compared with the recently reported elaborate Monte Carlo simulation with satisfactory agreement.
- 著者
- Sato Soshi Li Wei Kakushima Kuniyuki Ohmori Kenji Natori Kenji Yamada Keisaku Iwai Hiroshi
- 出版者
- American Institute of Physics
- 雑誌
- Applied physics letters (ISSN:00036951)
- 巻号頁・発行日
- vol.98, no.23, pp.233506, 2011-06
- 被引用文献数
- 9
Interfacial states of silicon nanowire field-effect transistors with rectangular-like cross-sections (wire height of 10 nm and widths of 9 and 18 nm) have been evaluated from the transfer characteristics in the subthreshold region measured at cryogenic temperatures, where kinks in the drain current becomes prominent. It is found that the kinks can be well-explained assuming local interfacial states near the conduction band (Ec). The main extracted local states have been shown to exist at 10 and 31 meV below Ec with the densities of 1.3×1013 cm−2/eV and 5.4×1012 cm−2/eV, respectively. By comparing two field-effect transistors with different wire widths, the former states can be assigned to the states located at the corner and the side surface of the wire, and the latter to the top and the bottom surfaces.