著者

Dilshadbek Tursunbayevich Usmanov Satoshi Ninomiya Lee Chuin Chen Subhrakanti Saha Mridul Kanti Mandal Yuji Sakai Rio Takaishi Ahsan Habib Kenzo Hiraoka Kentaro Yoshimura Sen Takeda Hiroshi Wada Hiroshi Nonami

出版者

The Mass Spectrometry Society of Japan

雑誌

Mass Spectrometry (ISSN:2187137X)

巻号頁・発行日

vol.6, no.2, pp.S0059-S0059, 2017-02-24 (Released:2017-02-24)

参考文献数

89

被引用文献数

9

---

In mass spectrometry, analytes must be released in the gas phase. There are two representative methods for the gasification of the condensed samples, i.e., ablation and desorption. While ablation is based on the explosion induced by the energy accumulated in the condensed matrix, desorption is a single molecular process taking place on the surface. In this paper, desorption methods for mass spectrometry developed in our laboratory: flash heating/rapid cooling, Leidenfrost phenomenon-assisted thermal desorption (LPTD), solid/solid friction, liquid/solid friction, electrospray droplet impact (EDI) ionization/desorption, and probe electrospray ionization (PESI), will be described. All the methods are concerned with the surface and interface phenomena. The concept of how to desorb less-volatility compounds from the surface will be discussed.

著者

Kenzo Hiraoka Yuji Sakai Hiroyuki Kubota Satoshi Ninomiya Stephanie Rankin-Turner

出版者

The Mass Spectrometry Society of Japan

雑誌

Mass Spectrometry (ISSN:2187137X)

巻号頁・発行日

vol.12, no.1, pp.A0114, 2023-01-31 (Released:2023-01-31)

参考文献数

35

被引用文献数

1

---

Among the various types of cluster secondary ion mass spectrometry (SIMS), electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) is unique due to its high ionization efficiency and non-selective atomic/molecular-level surface etching ability. In this study, EDI/SIMS was applied to the non-selective etching of synthetic polymers of polystyrene (PS) and poly(9,9-di-n-octylfluonyl-2,7diyl) (PFO) deposited on a silicon substrate. The polymers gave characteristic fragment ions and the mass spectra remained unchanged with prolonged EDI irradiation time, indicating that non-selective etching can be achieved by EDI irradiation, a finding that is consistent with our previous reports based on EDI/X-ray photoelectron spectroscopy analyses. From the irradiation time and film thickness, the etching rates for PS and PFO were roughly estimated to be 0.6 nm/min and 0.15 nm/min, respectively, under the experimental conditions that were used. After the depletion of polymer sample on the surface, ion signals originating from the exposed silicon substrate were observed. This indicates that EDI/SIMS is applicable to the analysis of the interface of multilayered films composed of organic and inorganic materials.