著者

鈴木 基史

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.57, no.8, pp.303-307, 2014 (Released:2014-08-25)

参考文献数

3

被引用文献数

2

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Thin films have recently emerged as one of the most important building blocks of nanotechnology and are often prepared under vacuum conditions. For efficient production of high-quality thin films, it is important to understand the impact of the vacuum on each stage of the thin film deposition processes, including decomposition of the starting material, transport of its vapor, and deposition. This article discusses the general key aspects of the thin film deposition process from the viewpoint of vacuum science and technology.