著者

Li Tsung-Lung Ting Jyh-Hua

出版者

公益社団法人 応用物理学会

雑誌

Japanese Journal of Applied Physics (ISSN:00214922)

巻号頁・発行日

vol.44, no.8, pp.6327-6331, 2005

被引用文献数

3

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The temporal saturation effects of the critical dimensions of nanoscale contact holes are investigated by a two-dimensional reaction–diffusion simulator for the chemical shrink techniques of nanolithography. Models included with the simulator are the crosslinking reaction of water-soluble polymers and crosslinkers, the diffusion of photoacids, and the inactivation of photoacids. Within the the statistical errors of the experimental data, the simulation critical dimensions agree with the experiment for baking temperatures over 105°C and for all baking times. It is found that the temporal saturation of the contact holes' critical dimensions can be explained by the photoacid inactivating reaction included in the simulator.