著者

表 和彦 伊藤 義泰

出版者

公益社団法人 日本表面科学会

雑誌

表面科学 (ISSN:03885321)

巻号頁・発行日

vol.27, no.11, pp.642-648, 2006-11-10 (Released:2007-04-04)

参考文献数

15

被引用文献数

2 2

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X-ray reflectivity (XRR) is a powerful technique for evaluating nanometer scale film structures. In principle, it is rested on interference of X-rays reflected on surface and interface of the film stacks. If we have a proper structural model for film stacks, calculation of XRR pattern is a physically well-defined procedure based on the Fresnel formula that only needs well known physical constants, wavelength of X-ray and refractive indices of film materials for X-ray. Therefore, XRR is capable of providing standard nano-film thickness ensuring SI unit traceability. We discuss roots of errors for the evaluated film structures, for example, miss-alignment of sample positions andso on. We also present several trials to diminish uncertainties of measured film structures.