- 著者
-
李 展平
星 孝弘
広川 吉之助
- 出版者
- 公益社団法人 日本表面科学会
- 雑誌
- 表面科学 (ISSN:03885321)
- 巻号頁・発行日
- vol.21, no.10, pp.651-665, 2000-10-10
- 参考文献数
- 7
- 被引用文献数
-
10
Gallium ion TOF-SIMS fragment patterns from some metal-chlorides and -oxides can be qualitatively inferred. Considering the electron affinities of Cl and O, comparatively higher than those of other metal elements, rules of <i>nx</i> ≥ (<i>y</i> + 1) for positive ions and <i>nx</i> ≤ (<i>y</i> + 1) for negative ions were introduced and applied to infer the fragment patterns of metal-chlorides, M<sub><i>x</i></sub>Cl<sub><i>y</i></sub>, where the oxidation number of metal M is <i>n</i>. For oxides, M<sub><i>x</i></sub>O<sub><i>y</i></sub> (oxidation number of metal M is <i>n</i>), the rules used to infer the fragment patterns <i>nx</i> ≥ (2<i>y</i> + 1) for positive ions and <i>nx</i> ≤ (2<i>y</i> + 1) for negative ions. Further, the effect of water on the surfaces of chlorides and oxides, and the fragment patterns of some metal-nitrates are discussed.