著者

李 展平 星 孝弘 広川 吉之助

出版者

公益社団法人 日本表面科学会

雑誌

表面科学 (ISSN:03885321)

巻号頁・発行日

vol.21, no.10, pp.651-665, 2000-10-10

参考文献数

7

被引用文献数

10

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Gallium ion TOF-SIMS fragment patterns from some metal-chlorides and -oxides can be qualitatively inferred. Considering the electron affinities of Cl and O, comparatively higher than those of other metal elements, rules of <i>nx</i> &ge; (<i>y</i> + 1) for positive ions and <i>nx</i> &le; (<i>y</i> + 1) for negative ions were introduced and applied to infer the fragment patterns of metal-chlorides, M_<i>x</i>Cl_<i>y</i>, where the oxidation number of metal M is <i>n</i>. For oxides, M_<i>x</i>O_<i>y</i> (oxidation number of metal M is <i>n</i>), the rules used to infer the fragment patterns <i>nx</i> &ge; (2<i>y</i> + 1) for positive ions and <i>nx</i> &le; (2<i>y</i> + 1) for negative ions. Further, the effect of water on the surfaces of chlorides and oxides, and the fragment patterns of some metal-nitrates are discussed.