著者

佐々木 実 陳俊中 エドウィン 羽根 一博

出版者

The Institute of Electrical Engineers of Japan

雑誌

電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society (ISSN:13418939)

巻号頁・発行日

vol.126, no.6, pp.241-242, 2006-06-01

被引用文献数

1

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An exposure method for realizing fine patterning on three-dimensional samples is described. Three-dimensional sample requires the different viewpoint from that of the proximity patterning. Concave areas can not be geometrically approached to the mask. The fine patterning becomes difficult due to the broadening of the exposure light. In this study, the phase shift mask is combined with the well-collimated mercury lamp. 5 μm-width line pattern is stably obtained on the 200 μm-deep cavity bottom.