著者
小幡 孝太郎 杉岡 幸次 甲野 竜哉 高井 裕司 豊田 浩一 緑川 克美
出版者
一般社団法人 電気学会
雑誌
電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society (ISSN:03854221)
巻号頁・発行日
vol.123, no.2, pp.241-245, 2003-02-01
参考文献数
13

Dynamics of ablation of fused silica by multiwavelength excitation process using F<sub>2</sub> and KrF excimer laser has been investigated by energy analyzed mass spectrometry of ablated species. The number of generated Si<sup>+</sup> ion by multiwavelength excitation process corresponds to that by single-F<sub>2</sub> laser ablation and to approximately 2.1 times higher than that by single-KrF excimer laser ablation. In addition, kinetic energy distribution of Si<sup>+</sup> ablated by multiwavelength excitation process shows almost same as that by single-F<sub>2</sub> laser ablation. We regard that absorption of KrF excimer laser by excited state generated by F<sub>2</sub> laser (excited-state absorption: ESA) causes effective photoionization, resulting in enhancement of Si<sup>+</sup> with higher kinetic energy and then in high-quality ablation.

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CiNii 論文 -  石英ガラスのF_2-KrFレーザ多重波長励起アブレーションによる放出イオン種の観察 http://t.co/LJX1oObn #CiNii

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