- 著者
-
外村 彰
松田 強
遠藤 潤二
- 出版者
- 公益社団法人 応用物理学会
- 雑誌
- 応用物理 (ISSN:03698009)
- 巻号頁・発行日
- vol.48, no.11, pp.1094-1100, 1979-11-10 (Released:2009-02-09)
- 参考文献数
- 28
- 被引用文献数
-
1
Electron holography has recently made a remarkable progress due to the high coherence of an electron beam generated in a newly developed field emission electron microscope and almost reached the stage of practical reality. This review describes firstly the objectives of electron holography: the improvement of electron microscope resolution and the development of new functions that have never been possible with conventional electron microscopes. Secondly three technical advances of electron holography are also described: generation of the electron beam with high coherence, improvement of the electron hologram formation method and compensation of the spherical aberration of electron lens. Furthermore interference microscopy was realized which gives information on thickness and magnetization distribution of specimen.