著者

尾澤 伸樹 石川 宗幸 中村 美穂 久保 百司

出版者

公益社団法人 日本表面科学会

雑誌

表面科学 (ISSN:03885321)

巻号頁・発行日

vol.33, no.6, pp.351-356, 2012-06-10 (Released:2012-06-29)

参考文献数

4

被引用文献数

7 14

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A chemical mechanical polishing (CMP) mechanism of a glass surface by a CeO2 abrasive grain under water environment has not been elucidated because the CMP process is complicated combination of chemical reactions and mechanical polishing. In this review, we introduce our successful clarification of the CMP mechanism by computational simulation methods. First, we revealed that the oxygen defects in the CeO2 abrasive grains lead to the generation of exposed Ce3+ atoms on the CeO2 surface and then the chemical reactions of the exposed Ce3+ atom and the glass surface make the elongation of Si-O bonds. We also clarified that H2O molecules react with the above elongated Si-O bonds and then the Si-O bonds are dissociated. These chemical reactions are suggested to soften the glass surface and enhance the mechanical polishing. Furthermore, according to the above clarified CMP mechanism, we succeeded to propose the design principles for the alternative materials of CeO2 abrasive grains.