2 0 0 0 OA 微細構造表面プラズモン共鳴による近接場光の波長制御とエネルギー変換
- 著者
- 鄭 東 田中 三郎 宮崎 康次 高尻 雅之
- 出版者
- 一般社団法人日本機械学会
- 雑誌
- マイクロ・ナノ工学シンポジウム
- 巻号頁・発行日
- vol.2013, no.5, pp.63-64, 2013-11-04
We investigated strain and grain size effects on the thermal transport of nanocrystalline bismuth antimony telluride thin films using both experimental studies and modeling. The fabricated thin films exhibited the average grain sizes of 30 < d < 100 nm, and the strain of-0.8% < ε < -1.4% in the c-axis direction whereas that of a-b-axis direction was constant at 1.7%. The thermal conductivities were measured using a 3ω method at room temperature. We calculated the lattice thermal conductivity using a simplified phonon transport model that accounts for the strain effect based on Christoffel equation and Lennard-Jones potential, and the grain size effect based on the full distribution of mean free paths. The theoretical calculation was largely in good agreement with our experimental results, and the detailed results will be discussed in the Symposium.
2 0 0 0 IR フラッシュ蒸着法によるn形ビスマステルライド系薄膜の生成
- 著者
- 高尻 雅之 白川 寿照 宮崎 康次 塚本 寛
- 出版者
- 一般社団法人日本機械学会
- 雑誌
- 日本機械学會論文集. A編 (ISSN:03875008)
- 巻号頁・発行日
- vol.72, no.723, pp.1793-1798, 2006-11-25
- 参考文献数
- 27
- 被引用文献数
- 8
n-type bismuth-telluride thin films are fabricated by flash evaporation method. Effects of hydrogen annealing on the thin films are investigated for potential application in micro thermoelectric devices. The thin films are grown up to 1 μm on a glass substrate by flash evaporation method. The hydrogen annealing is carried out in the temperature range between 200-350℃ on an atmospheric pressure. The electrical resistivity and Seebeck coefficient are measured at room temperature. Both the electrical resistivity and Seebeck coefficient are improved by the treatment of hydrogen annealing, then the power factor of the n-type bismuth-telluride thin film reaches 8.8μW・cm^<-1>・K^2 at annealing temperature of 350℃. The structure of the thin films, which is composition and crystallinity, is studied by electron probe micro analyzer and X-ray diffraction pattern, respectively. The composition of bismuth-telluride thin films is relativity constant until higher annealing temperature. The X-ray diffraction patterns indicate that the crystallinity of the thin films is improved as higher annealing temperature.
- 著者
- 宮崎 康次 黒崎 潤一郎 笠井 哲郎 原田 一興 塚本 寛
- 出版者
- 一般社団法人日本機械学会
- 雑誌
- 熱工学コンファレンス講演論文集
- 巻号頁・発行日
- vol.2007, pp.421-422, 2007-11-23
We fabricated bismuth-telluride based thin films and their in-plane thermoelectric micro-generators on a free standing silicon nitride thin film by using the flash evaporation method through shadow masks. The shadow masks are fabricated by standard micro-fabrication processes. The fabricated micro-generators are just put on a heated plate, and the open-circuit output voltages of micro-generators are measured by a digital voltmeter. The maximum measured voltage is about 40mV at 10K temperature difference. The output voltage is comparable to the bulk value although the device consists of as-grown thin films.
1 0 0 0 p型ビスマステルライドを用いたナノ多孔体薄膜の熱伝導率計測
- 著者
- 田中 三郎 宮崎 康次 塚本 寛
- 出版者
- 社団法人 日本伝熱学会
- 雑誌
- 日本伝熱シンポジウム講演論文集
- 巻号頁・発行日
- vol.2009, pp.224-224, 2009
p型ビスマステルライドをビーズミルを用いてナノ粒子を作製,有機溶剤に分散させ,ペースト状のナノ粒子をアルミナ基板に塗布,薄膜の作製を行った.ナノ多孔体薄膜の熱伝導率を3オメガ法により-170℃から室温の範囲で測定した.薄膜の熱伝導率はバルクよりも大幅に小さく,低温になるにつれ熱伝導率は増加せず,バルクと異なる温度依存性を示した.これらの結果から,ナノ粒子で作製したナノ多孔体の熱伝導に及ぼす影響を考察した.