著者

IWATSUKI Yukio NAGINO Hayato TANAKA Fumiya WADA Hidetoshi TANAHARA Kei WADA Masaaki TANAKA Hiroyuki HIDAKA Koichi KIMURA Seishi 岩槻 幸雄 投野 隼斗 田中 文也 和田 英敏 棚原 奎 和田 正昭 田中 宏幸 日高 浩一 木村 清志

出版者

三重大学大学院生物資源学研究科

雑誌

三重大学大学院生物資源学研究科紀要 = THE BULLETIN OF THE GRADUATE SCHOOL OF BIORESOURCES MIE UNIVERSITY

巻号頁・発行日

vol.43, pp.27-55, 2017-09

---

Annotated checklist of marine and fresh water fishes is reported from the Hyuga Nada area, including Miyazaki Prefecture, southern coastal area of Oita Prefecture and eastern coast of Kagoshima Prefecture, southwestern Japan. Such fishes are classified into 228 families, 680 genera and 1,340 species including 24 subspecies and 1 hybrid, consisting of natural inhabitants in the area, and invasive and introduced fishes as alien species out of Japan or from the other areas. Confirmation of each species on identification is based on voucher specimens kept in Miyazaki University and other museums, photographs of fishes taken in the area, confirmed photographs in websites and references formerly reported before August 2016. Fish occurrence tendency by our gross observation is noted at each species.

著者

Tawarayama Kazuo Aoyama Hajime Kamo Takashi Magoshi Shunko Tanaka Yuusuke Shirai Seiichiro Tanaka Hiroyuki

出版者

Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

雑誌

Jpn J Appl Phys (ISSN:00214922)

巻号頁・発行日

vol.48, no.6, pp.06FA02-06FA02-6, 2009-06-25

被引用文献数

6

---

The Selete full-field etreme ultraviolet (EUV) exposure tool, the EUV1, was manufactured by Nikon and is being developed at Selete. Its lithographic performance was evaluated in exposure experiments with a static slit using line and space (L&S) patterns, Selete Standard Resist 03 (SSR3), a numerical aperture (NA) of 0.25, and conventional illumination ($\sigma = 0.8$). The results showed that 25 nm L&S patterns were resolved. Dynamic exposure experiments showed the resolution to be 45 nm across the exposure field and the critical dimension (CD) uniformity across a shot to be 7 nm, which is sufficient for an alpha-level lithography tool.

著者

青木 真兵 田中 宏幸 大城 道則 大城 道則 Aoki Shimpei Tanaka Hiroyuki Ohshiro Michinori

出版者

駒沢史学会

雑誌

駒沢史学 (ISSN:04506928)

巻号頁・発行日

no.82, pp.115-131, 2014-03

著者

田中 弘之 タナカ ヒロユキ Tanaka Hiroyuki

出版者

駒沢史学会

雑誌

駒沢史学 = Journal of historical studies (ISSN:04506928)

巻号頁・発行日

no.86, pp.130-137, 2016-03