著者

柴田 恭

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.60, no.6, pp.201-211, 2017 (Released:2017-07-14)

被引用文献数

1 1

著者

塚原 規志

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.60, no.5, pp.165-169, 2017 (Released:2017-05-12)

参考文献数

25

---

By scanning tunneling microscopy and spectroscopy (STM/S), the spin state of a magnetic adsorbate which shows Kondo effect on the non-metal surfaces can be explored from the Kondo resonance. Kondo resonance appears as a zero-bias anomaly in the STS spectra, and I introduce the ways to assign the zero-bias anomaly to be the Kondo resonance and to extract the information of the spin state with my recent research, the Kondo effect of iron phthalocyanine (FePc) molecules on Au(111). The control of the spin state of FePc on Au(111) by coordination chemistry is also introduced as another example.

著者

吉原 一紘

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.56, no.4, pp.153-157, 2013 (Released:2013-05-10)

参考文献数

3

著者

深川 弘彦

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.58, no.3, pp.86-90, 2015 (Released:2015-03-27)

参考文献数

21

---

Highly efficient and stable phosphorescent organic-light emitting diodes (PHOLEDs) were demonstrated in view of optimization of emitting and/or carrier transporting materials. The device characteristics of the red PHOLED was improved by selecting a host material, which surrounds the phosphorescent dopant. The host/dopant combination was found to be a crucial factor in obtaining high efficiency and stability in the PHOLEDs. On the other hand, the novel hole-transporting materials were synthesized to improve the efficiency and operational stability of green PHOLEDs. The optimized red and green OLEDs exhibit a maximum external quantum efficiency of about 20% and an expected half lifetime of over 10,000 h with an initial luminance of 1,000 cd/m2.

著者

松田 理 オリバーB. ライト

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.53, no.5, pp.336-343, 2010 (Released:2010-06-10)

参考文献数

42

被引用文献数

1

---

Ultrashort light pulses absorbed in a medium generate both bulk and surface acoustic waves: we focus here on imaging the surface waves and on monitoring the bulk acoustic waves that propagate in the depth direction. This is done in the time domain by delayed probe light pulses. For the bulk acoustic waves, the generated frequency ranges up to 1 THz. Some studies concerning the ultrafast electron-phonon relaxation in metal films, high frequency generation in semiconductor quantum wells, and high frequency shear acoustic wave generation and detection are reviewed here. For the surface acoustic waves the generated frequency ranges up to 1 GHz, and time-resolved two-dimensional images of the propagation are obtained with micron lateral spatial resolution. This imaging method is applied to anisotropic crystals and phononic crystals to elucidate their acoustic properties.

著者

深谷 幸信 大野 弘幸

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.56, no.3, pp.97-103, 2013 (Released:2013-04-24)

参考文献数

22

被引用文献数

1

---

Development of ionic liquids for biomass processing, especially our recent development of functional ionic liquids has been described. For efficient biomass processing, we analyzed the physical chemistry of ionic liquids, focusing on the possibility to dissolve naturally-derived materials for energy conversion. We herein reviewed design of a wide variety of functional ionic liquids with special ion structure to enable dissolution of cellulose, extraction of valuable materials from biomass, and hydrolysis of cellulose. Moreover, we described a new class of an analytical method to analyze biomass processing with ionic liquids.

著者

土佐 正弘

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.57, no.8, pp.295-298, 2014 (Released:2014-08-25)

参考文献数

5

被引用文献数

1

---

Vacuum chambers, components and related systems consist of various materials according to requiring material performance. Austenitic stainless steels have been used for vacuum chambers due to high mechanical strength, anti-corrosion and low outgassing. Aluminum alloy have been used for special vacuum systems such as particle accelerator due to non-magnetism and low radioactivation. Copper has been used for flange gasket due to good ductility. Ceramics have been used for components of electrical insulator, high temperature system and so on due to good stability under harsh environments. Organic materials are less used due to their high outgassing rate compared with inorganic materials. It is important to select and put the right material in the right place in a vacuum system.

著者

村上 浩一

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.53, no.4, pp.265-270, 2010 (Released:2010-05-18)

参考文献数

12

---

We review recent works on 1) an isotope effect of penetration of Hydrogen(H) and Deuterium(D) into Silicon through Si/SiO2 interface and 2) H effects for Si nanostructures, as well as summary of hydrogen states in crystal Si. In particular, a new filtering effect of H and D isotope atoms was found for penetration process into crystal silicon (Si) through the interface between a Si and SiO2 native oxide layer. More H atoms are introduced into Si than D for mixing gases. This phenomenon can be tentatively explained in terms of an isotope filtering model of H and D via an intermediate cluster state formed at the interface between the native SiO2 layer and crystal Si. Hydrogen passivation of interface defects is shown to be needed for knowing proper impurity doping effects, and electronic, optical, and magnetic properties in Si nanostructures.

著者

福谷 克之

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.56, no.6, pp.204-209, 2013 (Released:2013-06-28)

参考文献数

2

被引用文献数

1 4

---

Any vacuum chamber has interior surfaces of the chamber facing toward the vacuum. Interaction of gas molecules with the chamber surface including scattering, adsorption and desorption is thus of particular importance for vacuum technology. The present article describes fundamental concepts of gas-surface interaction, which encompass the thermal accommodation coefficient, cosine law, adsorption potential, mean time of sojourn and adsorption isotherm.

著者

中島 章

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.58, no.11, pp.417-423, 2015 (Released:2015-11-26)

参考文献数

78

被引用文献数

2

---

Wettability control of a solid against a liquid is widely investigated in industry for application to daily life because it can produce various physical and chemical phenomena related to solids and liquids, achieving beneficial purposes. Recent researches revealed that static and dynamic wettability are affected by nano-scale surface characteristics on the solids, and the importance of the viewpoint from materials science is gradually increasing in this topic. This paper presents a short review of the studies on the superhydrophilicity of TiO2 photocatalyst, processing and properties of superhydrophobic materials, and control of dynamic hydrophobicity, mainly of the past decade of our group.

著者

後藤 康仁

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.59, no.7, pp.184-191, 2016 (Released:2016-07-16)

参考文献数

25

被引用文献数

2

---

In this article, potential dangers of vacuum technologies are revealed, and safety measures for these dangers have been suggested. These dangers include considerable difference between the vessels' inner and outer pressures, condensation of flammable gases to the pump, electric shock due to a high voltage or electric leakage, involution to mechanical motion, touching of a high temperature during baking. Furthermore, many dangers exist when the system is under repair or maintenance. In addition to the vacuum system itself, the materials used for its operation such as liquid cryogen and organic solvents are more hazardous. Finally, some of the safety measures are proposed for the aforementioned dangers.

著者

金原 粲

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.53, no.6, pp.424-426, 2010 (Released:2010-07-07)

著者

金原 粲

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.54, no.12, pp.627-630, 2011 (Released:2012-01-12)

著者

清水 徹英 ミシェル ビラマヨア ジュリアン ケラウディ ダニエル ルンディン ウルフ ヘルマーソン

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.60, no.9, pp.346-351, 2017 (Released:2017-09-13)

参考文献数

29

被引用文献数

2

---

This is to review a novel approach stabilizing reactive mode at transition regime in reactive high-power impulse magnetron sputtering (R-HiPIMS). The proposed method is based on a real-time monitoring of peak discharge current. To stabilize the process conditions at a given set point, a feedback control system, which automatically regulates the pulse frequency, and thereby the average sputtering power, was implemented to maintain a constant maximum discharge current. As a representative result, the variation of the pulse current waveforms over a wide range of reactive gas flows and pulse frequencies during a R-HiPIMS of Hf in an Ar-N2 atmosphere illustrates that the discharge current waveform is an excellent indicator of the process conditions. Applicability of the proposed method was successfully demonstrated.

著者

野沢 善幸

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.53, no.7, pp.446-453, 2010 (Released:2010-08-19)

参考文献数

11

被引用文献数

1 5

---

Deep Reactive Ion Etching1-3) is well established as a commercial technique for forming Micro-Electro-Mechanical Systems (MEMS) devices. Over the last decade, development work has led to increases in silicon etch rate of an order of magnitude while requirements for etch depth uniformity and profile control have become more stringent as the wafer size has increased from 3 inch up to 200 mm.   Many MEMS devices are still etched on 150 mm wafers, while most IC devices requiring Chip Scale Package (CSP) or other processing relating to Advanced Packaging will be manufactured on 200 mm wafers with planned moves to 300 mm wafers in progress or imminent.   This paper describes the leading edge technology of Deep Si RIE including high rate etching and Through Silicon Vias (TSVs) hole formation on wafers up to 300 mm in diameter.

著者

石渡 信吾 鈴木 敦 岡 駿資 首藤 健一

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.58, no.12, pp.442-445, 2015 (Released:2015-12-29)

参考文献数

11

被引用文献数

1

---

In order to fabricate scanning probe tips, control of the electrochemical current is crucial to the radii of the head point. Equipment that monitors the current with a hysteresis switch, realized by means of a Schmitt trigger mechanism, enables the stable fabrication of high-quality tips. The details of the circuit design are described.

著者

鈴木 基史

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.57, no.8, pp.303-307, 2014 (Released:2014-08-25)

参考文献数

3

被引用文献数

2

---

Thin films have recently emerged as one of the most important building blocks of nanotechnology and are often prepared under vacuum conditions. For efficient production of high-quality thin films, it is important to understand the impact of the vacuum on each stage of the thin film deposition processes, including decomposition of the starting material, transport of its vapor, and deposition. This article discusses the general key aspects of the thin film deposition process from the viewpoint of vacuum science and technology.

著者

黒河 明

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.56, no.8, pp.307-314, 2013 (Released:2013-08-27)

参考文献数

61

被引用文献数

1 1

---

Surface-treatment methods using ozone, such ozone gas treatment with UV light irradiation, immersion in ozone diluted water, and exposure to ozone gas are discussed herein. The objectives of performing ozone surface treatments are to reduce carbon-related contamination on the surface, prepare a clean substrate surface to fabricate a thin-film stacking with sharp interfaces, oxidize a surface to form high-quality oxide thin films, and passivate a metal surface to increase its corrosion resistance. These objectives are achieved because of the high oxidation ability of the ozone molecules and the oxygen radicals resulting from the ozone dissociation. Various applications of ozone surface treatment are also exemplified in this report to reveal their significant potential as surface-treatment tools.

著者

市村 正也

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.58, no.8, pp.273-281, 2015 (Released:2015-09-04)

参考文献数

5

被引用文献数

3

---

The purpose of this article is to provide an introduction to vacuum science and technology for absolute beginners. The kinetic theory of gases is briefly described in the initial introductory part. The body of this article is divided into three parts. The first part deals with vacuum pumps. The operation principles are explained for several popular types of vacuum pumps. The second part deals with vacuum gauges. The operations of commonly used vacuum gauges are discussed. The third one deals with vacuum-tight connection with tubes and flanges. Throughout the text, basic concepts and technical terms are explained so that the text can be easily understood even by very beginners. Caution points for using vacuum systems are also given.

著者

田村 和宏 大熊 春夫 高野 史郎 正木 満博 持箸 晃

出版者

一般社団法人 日本真空学会

雑誌

Journal of the Vacuum Society of Japan (ISSN:18822398)

巻号頁・発行日

vol.54, no.3, pp.155-157, 2011 (Released:2011-05-17)

参考文献数

2

被引用文献数

1

---

Radiation shields are required in beamlines (BL) that transport synchrotron radiation (SR) to stop high energy radiation that is scattered by instruments upstream of a BL. Radiation shields guarantee radiation safety in the downstream of the BL and need to be installed in the vacuum system of the BL. In order to limit the opening against unnecessary scattered radiation and to keep the effective aperture for SR as large as possible, a new type of radiation shield, which utilizes tungsten alloy with an opening as an ultra-high vacuum chamber, has been developed.