著者
稲本 将史 栗原 英紀 矢嶋 龍彦
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.62, no.10, pp.516-516, 2011-10-01 (Released:2012-04-20)
参考文献数
25

Sulfur-added vanadium pentoxide (S-V2O5) powder prepared using our method was applied to the cathode active material used in magnesium rechargeable batteries. The preparation of S-V2O5 from a sulfur and vanadium pentoxide mixture was done with low-temperature plasma generated using carbon felt and 2.45-GHz microwave (CF-MWP). The S-V2O5 structure was investigated using XRD, XPS, Raman spectroscopy, and DRS-FTIR. Results revealed that the S-V2O5 particle surface contains sulfur atoms and that its structure is amorphous, like xerogel, although the bulk preserved the same structure as that of V2O5 crystal. Charge-discharge tests for S-V2O5 showed exceedingly high specific capacity of 300 mAhg−1, which far surpasses that of V2O5 (160 mAhg−1). The cycle performance of S-V2O5 (300 mAhg−1 after 20 cycles) was also more stable than that of V2O5 (70 mAhg−1 after first cycle). Moreover, the discharge voltage and the specific capacity did not degrade under any discharge rate condition from C/2 to C/10.
著者
面谷 信
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.61, no.7, pp.468-468, 2010-07-01 (Released:2011-01-31)
参考文献数
31
著者
来田 勝継
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.55, no.10, pp.626-626, 2004 (Released:2005-09-05)
参考文献数
10
被引用文献数
2 2
著者
佐々木 光雄
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.50, no.6, pp.521-525, 1999-06-01 (Released:2009-10-30)
参考文献数
8
著者
清水 悟
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.58, no.2, pp.81, 2007 (Released:2007-10-19)
参考文献数
68
被引用文献数
5 5
著者
尾形 幹夫
出版者
一般社団法人 表面技術協会
雑誌
金属表面技術 (ISSN:00260614)
巻号頁・発行日
vol.26, no.12, pp.592-596, 1975-12-01 (Released:2009-10-30)
参考文献数
5

Experiments were carried out to find the mechanism of galvanic displacement: Fe+Cu2+→Fe2++Cu. When iron is immersed in a concentrated copper sulfate solution, e.g., 0.5M, a poorly adherent copper is deposited. In this case FeSO4 or Fe2O3 coprecipitated with the copper because the concentration of Fe2+ near the interface increased rapidly immediately after the immersion. However, atyell adherent copper was deposited by immersion in an acidic dilute copper sulfate solution, e.g., 0.01M, pH 1.5. In this case the rate of copper deposition, namely, the rate of formation of Fe2+ was slow, so that the Fe2+ was permitted to diffuse into the bulk of the solution without precipitating, which was the case of well adherent copper plate. The formulation of immersion plating of copper on iron was: CuSO4 0.0025-0.03M, pH<2.5, room temperature, immersion time 0.5-15min. The copper plating applied under these conditions was adherent to iron, hence copper could be electroplated on it from the ordinary pyrophosphate baths.
著者
尾山 卓司
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.60, no.10, pp.616-616, 2009-10-01 (Released:2010-04-20)
参考文献数
29
被引用文献数
1
著者
石崎 貴裕
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.61, no.11, pp.747-747, 2010-11-01 (Released:2011-05-31)
参考文献数
13
著者
伊藤 利道 平木 昭夫
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.46, no.5, pp.396-401, 1995-05-01 (Released:2009-10-30)
参考文献数
47
著者
部家 彰 松尾 直人
出版者
一般社団法人 表面技術協会
雑誌
表面技術 (ISSN:09151869)
巻号頁・発行日
vol.58, no.12, pp.836-836, 2007 (Released:2008-08-01)
参考文献数
14

The surface properties of a plastic substrate were changed using a novel surface treatment called atomic hydrogen annealing (AHA). In this method, a plastic substrate was exposed to atomic hydrogen generated by cracking hydrogen molecules on heated tungsten wire. Surface roughness was increased, and O atoms and halogen elements (F and Cl) were selectively etched by AHA. The surface modification of the PEN substrate affects the surface property of the SiNx film. Adhesion between the SiNx film and the PEN substrate in the SiNx film/PEN substrate prepared by Cat-CVD shows excellent properties.