- 著者
 
          - 
             
             Kita Yuki
             
             Yoshida Shinichi
             
             Hosoi Takuji
             
             Shimura Takayoshi
             
             Shiraishi Kenji
             
             Nara Yasuo
             
             Yamada Keisaku
             
             Watanabe Heiji
             
          
 
          
          
          - 出版者
 
          - American Institute of Physics
 
          
          
          - 雑誌
 
          - Applied physics letters (ISSN:00036951)
 
          
          
          - 巻号頁・発行日
 
          - vol.94, no.12, pp.122905, 2009-03 
 
          
          
          
          - 被引用文献数
 
          - 
             
             
             8
             
             
             8
 
             
          
        
        
        
        Change in the work function (WF) of the gate electrode material caused by the contact with Hf-based high-k gate dielectrics was investigated by means of the flat-band voltage (Vfb) shift in capacitance-voltage curves, and the interface dipole, which modifies the WF, was characterized by x-ray photoelectron spectroscopy. We observed a negative Vfb shift and corresponding interface dipole, which suggest the formation of oxygen vacancy (VO) in the Hf-based oxides. In contrast, we observed an opposite (positive) Vfb shift and interface dipole when Au electrodes were formed on cleaned Hf-based dielectrics. This indicates that Au–Hf bond hybridization at the Au/HfSiON interface also causes effective WF modulation, as theoretically predicted by Shiraishi et al. (Tech. - Dig. Int. Electron Devices Meet. 2005, 43).